The University of Hong KongThe University of Hong Kong
University Central Facilities
Interdisciplinary and Core Research Facilities

  1. Facilities
  2. Central Fabrication Laboratory (Lithography)

Raith PicoMaster 200
Maskless Laser Lithography

The Raith Picomaster 200 is a cutting-edge maskless laser lithography system designed for rapid, flexible, and high-resolution patterning. It enables direct writing without the need for masks, offering sub-micron precision and fast throughput. Ideal for research and prototyping, it supports applications in microelectronics, photonics, and advanced materials development.

Attachments / Specifications:

- 405nm laser source with 300nm optical resolution
- 375nm laser source with 300nm optical resolution
- Additional write modes 600nm and 900nm FWHM

Person-in-charge:

Mr. Yip P. S. - psanyip@hku.hk

Project/ Fund Source:

UDF(2020/21) 020100097, Optical Characterization Facility

SUSS MA/BA6 Gen4
Mask Aligner

SUSS MA/BA6 Gen4 Series mask aligner is a versatile lithography platform designed for high-precision microfabrication. It supports advanced processes including UV lithography, wafer bonding, and imprinting, offering superior alignment accuracy and flexibility. Ideal for R&D and production, it enables reliable patterning across diverse applications in semiconductors and photonics.

Attachments / Specifications:

- Substrate size: up to 150mm round wafers
- TSA alignmTop Side Alignment; ent accuracy: <0.5µm
- LED lamp house (include I-line, G-line, H-line)
- MO Exposure Optics
- Intensity uniformity <2.5%
- Constant dose accuracy: 1.5%
- Resolution down to 0.8 µm L/S (vacuum contact)

Person-in-charge:

Mr. Yip P. S. - psanyip@hku.hk

Project/ Fund Source:

BRC(2020/21)/ UDF(2020/21), Nanofabrication Facilities

Raith EBPG 5200+ (Coming Soon)
100kV Electron Beam Lithography

Raith EBPG 5200+ sets the benchmark in electron beam lithography, delivering unmatched precision and reliability for advanced nanofabrication. Designed for both research and industrial applications, it combines cutting-edge technology with user-friendly operation to achieve superior patterning results. With its high throughput and accuracy, the EBPG 5200+ empowers scientists and engineers to push the boundaries of innovation in microelectronics, photonics, and quantum device development. Overlay accuracy <10 nm makes it ideal for multilayer quantum devices, advanced photonics, and next-gen microelectronics.

Attachments / Specifications:

- Thermal field emission gun with 50 kV and 100 kV Beam Energy
- High current mode up to 350 nA for throughput
- High-resolution mode for sub-5 nm lithography
- Minimum feature size: < 8 nm
- Stitching accuracy: <15 nm (mean + 3σ)
- Overlay accuracy: <10 nm (mean + 3σ)
- Laser-interferometer controlled, wafer-scale handling (up to 200 mm wafers)
- Ultrafast pattern generator at 125 MHz
- Supports 200 mm (8-inch) wafers

Project/ Fund Source:

LREF(2022/23) 020300802, E-beam lithography system

Raith eLine+ (Coming Soon)
Electron Beam Lithography/ Scanning Electron Microscope

Raith eLINE+ is a multifunctional electron beam lithography (EBL) system designed for ultimate versatility, combining high-resolution patterning with advanced imaging and nanoengineering capabilities. It achieves sub-5 nm linewidths, offers a beam size down to 1.2 nm, and integrates FPGA-based pattern generation for precise and complex nanostructures.

Attachments / Specifications:

- Thermal field emission source with beam energy from 100 V to 30 kV
- Beam size: 1.2 nm
- FPGA-based 50 MHz / 20-bit pattern generator
- Laser-interferometer controlled, 2 nm precision, 100 mm × 100 mm travel
- Supports complex fracturing and arbitrary shape generation
- Stitching and overlay accuracy: ~25nm - 40nm (mean + 3σ)
- Demonstrated sub-5 nm linewidths in EBL resist
- 3D module inspection module
- 3Lith is a unique software package for generation and import of 3D GDSII lithography data

Project/ Fund Source:

LREF(2022/23) 020300802, E-beam lithography system